Patterning device cooling system and method of thermally conditioning a patterning device
AssigneeASML Netherlands B.V.
InventorsHakki Ergün CEKLI, Günes NAKÍBOGLU, Frank Johannes Jacobus, Jean-Philippe XAVIER, Richard Johannes Franciscus
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Abstract
A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.
Claims20
A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises:
- a thermal conditioner configured to thermally condition the patterning device;
- and
- a controller configured to control the thermal conditioner to cool the patterning device dependent on a value, other than or in addition to temperature, representing an amount of the exposure radiation absorbed by the patterning device.
A method of thermally conditioning a patterning device of a lithographic apparatus, the patterning device being irradiated by exposure radiation in use, the method comprising:
- thermally conditioning the patterning device to cool the patterning device dependent on value, other than or in addition to temperature, representing an amount of the exposure radiation absorbed by the patterning device.
Dependencies are inferred from the claim text.