Geometry vectorization for mask process correction
AssigneeGlobalfoundries Inc.
InventorsLiang Cao, Wenchao Jiang, Guoxiang Ning, Jie Zhang
Life of this patent
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Abstract
Various aspects include vectorization approaches for model-based mask proximity correction (MPC). In some cases, a computer-implemented method includes: assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC); adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data; predicting an adjustment to the at least one mask with the statistical predictive model; and adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
Claims20
A computer-implemented method comprising:
- assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC);
- adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data;
- predicting an adjustment to the at least one mask with the statistical predictive model;
- and
- adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
A computer program product comprising program code stored on a computer readable storage medium, which when executed by at least one computing device, causes the at least one computing device to perform actions including:
- assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC);
- adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data;
- predicting an adjustment to the at least one mask with the statistical predictive model;
- and
- adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
A system comprising:
- at least one computing device configured to perform actions including:
- assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC);
- adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data;
- predicting an adjustment to the at least one mask with the statistical predictive model;
- and
- adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
Dependencies are inferred from the claim text.