US 2019/0101817 A1 · EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

Abstract

A method of manufacturing an extreme ultraviolet mask, including forming a multilayer Mo/Si stack including alternating Mo and Si layers over a first major surface of a mask substrate, and forming a capping layer over the multilayer Mo/Si stack. An absorber layer is formed on the capping layer, and a hard mask layer is formed over the absorber layer. The hard mask layer is patterned to form a hard mask layer pattern. The hard mask layer pattern is extended into the absorber layer to expose the capping layer and form a mask pattern. A border pattern is formed around the mask pattern. The border pattern is extended through the multilayer Mo/Si stack to expose the mask substrate and form a trench surrounding the mask pattern. A passivation layer is formed along sidewalls of the trench.

Claims20

Dependent claims

A method of manufacturing an extreme ultraviolet mask, comprising:

forming a multilayer Mo/Si stack comprising alternating Mo and Si layers over a first major surface of a mask substrate;
forming a capping layer over the multilayer Mo/Si stack;
forming an absorber layer on the capping layer;
forming a hard mask layer over the absorber layer;
patterning the hard mask layer to form a hard mask layer pattern;
extending the hard mask layer pattern into the absorber layer to expose the capping layer and forming a mask pattern;
forming a border pattern around the mask pattern;
extending the border pattern through the multilayer Mo/Si stack exposing the mask substrate and forming a trench surrounding the mask pattern;
and
forming a passivation layer along sidewalls of the trench.

7 more elements

Dependencies are inferred from the claim text.

Extreme ultraviolet mask and method of manufacturing the same

Life of this patent

Extreme ultraviolet mask and method of manufacturing the same

Life of this patent

Abstract

Claims20