Back to results
US 2019/0101670 A1Published application
Antireflection film and method for preparing same
AssigneeLG Chem, Ltd.
InventorsJin Seok BYUN, Jae Young KIM, Yeong Rae CHANG, Yun U SHIN
Life of this patent
Estimating the term…
Abstract
The present invention relates to an antireflection film being capable of realizing high scratch resistance and antifouling property while simultaneously having low reflectivity and high light transmittance, and further being capable of enhancing screen sharpness of a display device, and a method for preparing the antireflection film.
Claims23
An antireflection film comprising:
- a hard coating layer or an antiglare layer;
- and
- a low refractive index layer formed on one side of the hard coating layer or the antiglare layer and including a binder resin, and hollow silica nanoparticles, metal oxide nanoparticles, and inorganic nanoparticles dispersed in the binder resin,
- wherein a first region containing the hollow silica nanoparticles, a second region containing the metal oxide nanoparticles, and a third region containing the inorganic nanoparticles are present in the low reflective index layer, and
- the first region, the second region, and the third region satisfy the following Equation 1:
- Refractive Index (n1) of First Region<Refractive Index (n3) of Third Region<Refractive Index (n2) of Second Region [Equation 1]
- wherein n1, n2, and n3 are refractive indexes obtained by carrying out Ellipsometry measurement at an incident angle of 70° over a wavelength range of 380 nm to 1000 nm.
4 more elements
15-16. (canceled)
18-22. (canceled)
A method for preparing an antireflection film, comprising steps of:
- coating a resin composition for forming a low refractive index layer containing a photocurable compound or its (co)polymer, a fluorine-containing compound containing a photoreactive functional group, a photoinitiator, hollow silica nanoparticles, metal oxide nanoparticles, and inorganic nanoparticles on a hard coating layer or an antiglare layer, and drying the coated product at a temperature of 35° C. to 100° C.;
- and
- photocuring the dried product of the resin composition.
28-29. (canceled)
Dependencies are inferred from the claim text.