Copper Electroplating Solution and Copper Electroplating Process

Abstract

The present disclosure relates to a copper electroplating solution and a copper electroplating process. The solution includes following components: 20 to 240 g/L of copper sulfate pentahydrate, 20 to 300 g/L of sulfuric acid, 25 to 120 mg/L of chlorine ion, 0.1 to 20 mg/L of a brightener, 1 to 2000 mg/L of an inhibitor, and the balance is deionized water; The brightener is selected from two of the group consisting of alkyl sulfonic acid thiols and derivatives thereof; the inhibitor is selected from one or more compounds of non-ionic surfactants. The solution of this disclosure can greatly improve the current density of plating and the throwing power (TP) of electroplating of the through hole of flexible boards, wherein the TP value can reach more than 200%, and the electroplating deposited copper layer in the hole is flat and the quality thereof meets the requirements of the flexible board.

Dependencies are inferred from the claim text.