Coating film, method for manufacturing same, and pvd apparatus
AssigneeNippon Itf, Inc.
InventorsHideki MORIGUCHI, Akinori SHIBATA
Life of this patent
Estimating the term…
Loading patent…
AssigneeNippon Itf, Inc.
InventorsHideki MORIGUCHI, Akinori SHIBATA
Estimating the term…
Provided is a physical vapor deposition (PVD) method in which a thick, hard carbon film having excellent durability can be formed, and chipping resistance and wear resistance can bot be achieved while improving the low friction properties and peeling resistance of the formed hard carbon film. Provided is a coating film having a total film thickness of greater than 1 μm and less than or equal to 50 μm, wherein, when observed using a bright field TEM image, the cross section of the coating film is revealed to consist of relatively white hard carbon layers and relatively black hard carbon layers alternately stacked in the thickness direction, and the white hard carbon layers have a region having a columns-shape, which has grown in the thickness direction.
A coating film, coated on a substrate surface, wherein
Dependencies are inferred from the claim text.