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AssigneesHewlett-Packard Development Company, L.P., The State of Oregon State Board of Higher Education on behalf of Oregon State University
InventorsJames Elmer Abbott, Jr., John M McGlone, Kristopher Olsen, Roberto A Pugliese, Greg Scott Long, Douglas A Keszler, John Wager
Estimating the term…
An amorphous thin metal film can include a combination of metals or metalloids including: 5 at % to 74 at % of a metalloid selected from the group of carbon, silicon, and boron; 5 at % to 74 at % of a first metal; 5 at % to 74 at % of a second metal; and 5 at % to 70 at % of a dopant. The first and second metals can be independently selected from the group of titanium, vanadium, chromium, iron, cobalt, nickel, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, hafnium, tantalum, tungsten, osmium, iridium, or platinum, wherein the first metal and the second metal can be different metals. The dopant can be selected from the group of oxygen, nitrogen, or combinations thereof. The metalloid, first metal, second metal, and dopant can account for at least 70 at % of the amorphous thin metal film.
An amorphous thin metal film, comprising:
A method, comprising:
A thermal inkjet printhead stack with an amorphous thin metal resistor, comprising:
Dependencies are inferred from the claim text.