Laser applying mechanism
AssigneeDisco Corporation
InventorKeiji NOMARU
Life of this patent
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AssigneeDisco Corporation
InventorKeiji NOMARU
Estimating the term…
A laser applying mechanism which has a laser oscillator adapted to oscillate a pulsed laser and to emit a linearly polarized pulsed laser beam. The laser applying mechanism includes: a polarization plane composing unit adapted to selectively synthesize a pulsed laser beam having a second polarization plane rotated by 90 degrees with respect to a pulsed laser beam having a first polarization plane which is emitted from the laser oscillator; an amplifier adapted to amplify a power of the pulsed laser beam composed by the polarization plane composing unit; and a pulsed laser beam extracting unit adapted to extract a pulsed laser beam having a polarization plane to be utilized, from among the pulsed laser beam having the first polarization plane and the pulsed laser beam having the second polarization plane which are contained in the pulsed laser beam amplified by the amplifier.
A laser applying mechanism having a laser oscillator adapted to oscillate a pulsed laser and to emit a linearly polarized pulsed laser beam, the laser applying mechanism comprising:
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