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US 2019/0099787 A1Published application
Sonic Cleaning of Brush
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHan-Yeou Huang, Chun-Hsiang Fan
Life of this patent
Estimating the term…
Abstract
A method includes cleaning a wafer with a brush element where the brush element collects particles from the wafer during the cleaning process. The brush element is immersed in a first cleaning liquid. An ultrasonic or megasonic vibration is applied to the first cleaning liquid. The ultrasonic or megasonic vibration causes the particles to dislodge from the brush element into the first cleaning liquid. The particles contaminate the first cleaning liquid.
Claims20
A method, comprising:
- cleaning a wafer with a brush element, the brush element collecting particles from the wafer cleaning;
- immersing the brush element in a first cleaning liquid;
- and
- applying a sonic vibration to the first cleaning liquid.
1 more element
A method, comprising:
- providing a cleaning vessel adjacent to a wafer cleaning station, the cleaning vessel comprising a transducer element;
- providing a supply line to the cleaning vessel;
- providing a drain line from the cleaning vessel;
- filling a portion of the cleaning vessel with a first cleaning liquid;
- submerging a brush cleaning head in the first cleaning liquid;
- and
- activating the transducer element at a first frequency causing a cleaning of the brush cleaning head.
4 more elements
A system for cleaning a wafer, comprising:
- a wafer cleaning station, comprising:
- a spray head, configured to spray a first cleaning liquid on a wafer,
- a wafer support platform, and
- a cleaning brush;
- and
- a cleaning vessel, comprising:
- a tank,
- an inlet pipe, configured to supply a second cleaning liquid to the tank,
- an outlet pipe, configured to drain contaminated second cleaning liquid from the tank, and
- a transducer, configured to vibrate at a first frequency when energized,
- wherein the wafer cleaning station is configured to move the cleaning brush to the tank, wherein the cleaning vessel is configured to energize the transducer when the cleaning brush is in the tank.
8 more elements
Dependencies are inferred from the claim text.