Etching solution recycling system and method for wafer etching apparatus
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChe-Lun FAN
Life of this patent
Estimating the term…
Abstract
An etching solution recycling system for a wafer etching apparatus is provided. The etching solution recycling system includes a settling tank, a seed provider, and a fluid control unit. The settling tank is connected to an etching tank of the wafer etching apparatus and configured to receive an etching solution from the etching tank. The seed provider is configured to provide at least one seed crystal into the settling tank to reduce the silicate concentration in the etching solution in the settling tank. The fluid control unit is configured to deliver the etching solution in the settling tank back into the etching tank.
Claims20
An etching solution recycling system for a wafer etching apparatus, comprising:
- a settling tank connected to an etching tank of the wafer etching apparatus and configured to receive an etching solution from the etching tank;
- a seed provider configured to provide at least one seed crystal into the settling tank to reduce a silicate concentration in the etching solution in the settling tank;
- and
- a fluid control unit configured to deliver the etching solution in the settling tank back into the etching tank.
A wafer etching apparatus, comprising:
- an etching tank configured to contain an etching solution;
- a settling tank configured to receive the etching solution from the etching tank;
- a seed provider configured to provide at least one seed crystal into the settling tank to reduce a silicate concentration in the etching solution in the settling tank;
- and
- a fluid control unit configured to deliver the etching solution in the settling tank back into the etching tank.
An etching solution recycling method for a wafer etching apparatus, comprising:
- delivering an etching solution from an etching tank of the wafer etching apparatus to a settling tank;
- providing at least one seed crystal into the settling tank to reduce a silicate concentration in the etching solution in the settling tank;
- and
- delivering the etching solution in the settling tank back into the etching tank.
Dependencies are inferred from the claim text.