Management system for a plant facility and method for managing a plant facility
AssigneeYokogawa Electric Corporation
InventorAtsushi Sato
Life of this patent
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Abstract
A management system for a plant facility is disclosed. The system includes a first field device that measures a process value, a first control node that calculates a first control value based on the process value, a second field device that operates according to the first control value, and an application node that configures one or more parameters for calculating the first control value. The first control node compares the first control value with a second control value calculated by one of the first field device, a second control node, and the application node. When determining that the first and the second control value are identical, the first control node sets the first control value to the second field device.
Claims20
A management system for a plant facility, comprising:
- a first field device that measures a process value;
- a second field device that controls a control object;
- an application node that configures one or more parameters for calculating a first control value that the second field device uses to control the control object;
- and
- a first control node that calculates the first control value based on the process value and the parameters;
- wherein
- the first control node compares the first control value with a second control value calculated based on the process value and the parameters by one of the first field device, the first control node, a second control node, and the application node,
- when determining that the first and the second control values are identical, the first control node sets the first control value to the second field device, and
- when determining that the first and the second control values are not identical, the first control node sends an error to the application node without setting the first control value to the second field device.
A method for managing a plant facility, comprising:
- measuring a process value in a first field device;
- configuring, by an application node, one or more parameters for calculating a first control value that a second field device uses to control a control object;
- in a first control node, calculating the first control value based on the measured process value and the parameters;
- in one of the first field device, the first control node, a second control node, and the application node, calculating a second control value based on the measured process value and the parameters;
- in the first control node, comparing the first control value with the second control value;
- in the first control node, when the first and the second control values are identical, setting the first control value to the second field device, and
- in the first control node, when the first and the second control values are not identical, sending an error to the application node without setting the first control value to the second field device.
Dependencies are inferred from the claim text.