Integrated magnetoresistive sensor, in particular three-axis magnetoresistive sensor and manufacturing method thereof

A process for manufacturing an integrated magnetoresistive device, comprising the steps of:

• forming an insulating layer on top of a first surface of a substrate having first and second surfaces;
• forming a magnetoresistor of a first ferromagnetic material within the insulating layer, the magnetoresistor defining a sensitivity plane parallel to the first and second surfaces;
• opening a trench in an additional substrate;
• coating a side wall of said trench with a second ferromagnetic material;
• and
• attaching the additional substrate to the insulating layer, said second ferrormagnetic material forming a concentrator having an arm on said side wall that extends longitudinally in a transverse direction to the sensitivity plane, said arm being offset from the magnetoresistor in a direction perpendicular to the first surface.

A process for manufacturing an integrated magnetoresistive device, comprising the steps of:

• opening a trench in a first surface of a substrate having first and second surfaces;
• coating a side wall of said trench with a second ferromagnetic material;
• forming an insulating layer on top of the first surface;
• and
• forming a magnetoresistor of a first ferromagnetic material within the insulating layer, the magnetoresistor defining a sensitivity plane parallel to the first and second surfaces;
• said second ferrormagnetic material forming a concentrator having an arm on said side wall that extends longitudinally in a transverse direction to the sensitivity plane, said arm being offset from the magnetoresistor in a direction perpendicular to the first surface.