Method for producing light-emitting device
AssigneeToyoda Gosei Co., Ltd.
InventorKimiyasu IDE
Life of this patent
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Abstract
To remove the mask formed by nanoimprinting after dry etching. A mask is formed by nanoimprinting on a back surface of a substrate. Subsequently, dry etching is performed using chlorine gas. Dry etching is finished with the mask kept remaining. A deteriorated layer is formed on the surface of the remaining mask. The mask is irradiated with plasma generated using a mixture gas of nitrogen and oxygen. Thereby, the deteriorated layer formed on the surface of the mask is removed by evaporation. The mask is removed by dissolving in BHF (buffered hydrofluoric acid).
Claims16
A method for producing a light-emitting device which includes forming an uneven shape on a front surface or a back surface of a substrate, the forming an uneven shape comprising:
- forming a mask being made of cured resin and having an uneven shape on a substrate by nanoimprinting;
- forming an uneven shape on a substrate by dry etching using a chlorine based gas and finishing dry etching with the mask kept remaining;
- removing a deteriorated layer on the surface of the mask by irradiating with plasma using an oxygen based gas;
- and
- removing the mask using buffered hydrofluoric acid.
Dependencies are inferred from the claim text.