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US 2019/0097060 A1Published application
Compact Vertical Injection Punch through Floating Gate Analog Memory and a Manufacture Thereof
AssigneeInternational Business Machines Corporation
InventorsEffendi Leobandung, Yulong Li, Tak Ning, Paul Michael Solomon, Chun-Chen Yeh
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Abstract
A vertical injection punchthrough based metal oxide semiconductor (VIPMOS) device and method of manufacturing the same, include a control gate, an erase gate, a floating gate, and an active area where the control gate, the erase gate, and the floating gate are coplanar and perpendicular to the active area.
Claims20
A vertical injection punchthrough-based metal oxide semiconductor (VIPMOS) device, comprising:
- a control gate;
- an erase gate;
- a floating gate;
- and
- an active area including an injector and a drain;
- wherein the control gate, the erase gate, and the floating gate are coplanar and perpendicular to the active area, and
- wherein the injector and the drain are located on a same isolation island that is separate from a different isolation island which includes the control gate, the erase gate, and the floating gate.
4 more elements
(canceled)
A neural network, comprising:
- a vertical injection punchthrough-based metal oxide semiconductor (VIPMOS) device, the device including:
- a control gate;
- an erase gate;
- a floating gate;
- and
- an active area including an injector and a drain;
- wherein the control gate, the erase gate, and the floating gate are coplanar and perpendicular to the active area, and
- wherein the injector and the drain are located on a same isolation island that is separate from a different isolation island which includes the control gate, the erase gate, and the floating gate.
5 more elements
(canceled)
A floating gate manufacturing method, the method comprising:
- growing a P+ EPI on an etched P-region;
- implanting an n-layer on an etched N+ region;
- growing an N+ EPI layer on the implanted n-layer in the etched N+ region;
- and
- making contacts to a control gate, an erase gate, and a floating gate,
- wherein the control gate, the erase gate, and the floating gate are coplanar and perpendicular to the N+ region and the P-region.
3 more elements
Dependencies are inferred from the claim text.