US 2019/0097007 A1 · INTEGRATED CIRCUIT DEVICES

Abstract

An integrated circuit device may include a pair of line structures. Each line structure may include a pair of conductive lines extending over a substrate in a first horizontal direction and a pair of insulating capping patterns respectively covering the pair of conductive lines. The integrated circuit device may include a conductive plug between the pair of line structures and a metal silicide film contacting a top surface of the conductive plug between the pair of insulating capping patterns. The conductive plug may have a first width between the pair of conductive lines and a second width between the pair of insulating capping patterns, in a second horizontal direction perpendicular to the first horizontal direction, where the second width is greater than the first width.

Claims22

Dependent claims

An integrated circuit device, comprising:

a pair of line structures including
a pair of conductive lines extending over a substrate in a first horizontal direction, and
a pair of insulating capping patterns respectively covering the pair of conductive lines;
a conductive plug between the pair of line structures, the conductive plug having a first width between the pair of conductive lines and a second width between the pair of insulating capping patterns, the first width and the second width in a second horizontal direction perpendicular to the first horizontal direction, the second width greater than the first width;
and
a metal silicide film contacting a top surface of the conductive plug between the pair of insulating capping patterns.

3 more elements

An integrated circuit device comprising:

a pair of line structures including
a pair of conductive lines extending over a substrate in a first horizontal direction, and
a pair of insulating capping patterns respectively covering the pair of conductive lines;
a plurality of contact structures arranged in a line between the pair of line structures;
and
a plurality of insulating fences arranged sequentially between adjacent contact structures of the plurality of contact structures between the pair of line structures,
wherein each contact structure of the plurality of contact structures includes
a conductive plug having a first width between the pair of conductive lines in a second horizontal direction and a second width between the pair of insulating capping patterns in the second horizontal direction, the second horizontal direction perpendicular to the first horizontal direction, the second width greater than the first width;
and
a metal silicide film contacting a top surface of the conductive plug.

7 more elements

Dependencies are inferred from the claim text.

Integrated circuit devices

Life of this patent

Integrated circuit devices

Life of this patent

Abstract

Claims22