Plasma processing-apparatus processing object support platform, plasma processing apparatus, and plasma processing method

A plasma processing-apparatus processing object support platform, comprising:

• a lower plate, the lower plate being electrically conductive;
• an upper plate provided on the lower plate, a processing object being placed on an upper surface of the upper plate;
• and
• a variable condenser provided along a circumferential direction of the lower plate in a region at an upper outer circumferential vicinity of the lower plate, the region having an annular configuration, the variable condenser including a plurality of first capacitance elements disposed on an inner circumferential side in the region having the annular configuration, and a plurality of second capacitance elements disposed on an outer circumferential side in the region having the annular configuration, a set of one of the first capacitance elements and one of the second capacitance elements being multiply arranged along the circumferential direction, mutually-different control voltages being suppliable to the one of the first capacitance elements and the one of the second capacitance elements.