Substrate treating method, substrate treating liquid and substrate treating apparatus

A substrate treating apparatus that is used in a substrate treating method including:

• a supplying step of supplying a substrate treating liquid containing a plastic crystalline material in a molten state to a pattern-formed surface of a substrate,
• a plastic crystalline layer forming step of bringing, on the pattern-formed surface, the plastic crystalline material into a state of a plastic crystal so as to form a plastic crystalline layer and
• a removing step of changing the plastic crystalline material in the state of the plastic crystal into a gas state without an intermediate phase of liquid so as to remove the plastic crystalline material from the pattern-formed surface,
• wherein the substrate treating apparatus includes
• a supplying unit adapted for supplying the substrate treating liquid to the pattern-formed surface of the substrate,
• a plastic crystalline layer forming unit adapted for forming the plastic crystalline layer on the pattern-formed surface by bringing the plastic crystalline material into the state of the plastic crystal and
• a removing unit adapted for removing the plastic crystalline material from the pattern-formed surface by changing the plastic crystalline material in the state of the plastic crystal into the gas state without the intermediate phase of liquid.