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US 2019/0096643 A1Published application
Smart chamber and smart chamber components
AssigneeApplied Materials, Inc.
InventorsSimon Nicholas BINNS, Brian T. WEST, Ronald Vern SCHAUER, Roger M. JOHNSON, Michael S. COX
Life of this patent
Estimating the term…
Abstract
A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.
Claims20
An apparatus for a process chamber, the apparatus comprising:
- a process chamber component;
- and
- a monitoring device containing encrypted data and coupled to the process chamber component, the monitoring device configured to operate at a first radio frequency range different than a second radio frequency range that the process chamber operates in.
A sputtering target for a sputtering chamber, the sputtering target comprising:
- a backing plate;
- a monitoring device containing encrypted data and positioned on a first surface of the backing plate, the monitoring device being operable at a first radio frequency range;
- and
- a sputtering plate mounted on a second surface of the backing plate, the sputtering chamber being operable at a second radio frequency range that is different than the first radio frequency range.
1 more element
A magnetron comprising:
- a magnet disposed in a chamber, the chamber being operable at a first radio frequency range;
- and
- a monitoring device coupled to a metallic component of the magnetron, the monitoring device operable at a second radio frequency range that is different than the first radio frequency range.
Dependencies are inferred from the claim text.