Metal Cut Optimization for Standard Cells
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCheok-Kei LEI, Chi-Lin Liu, Hui-Zhong Zhuang, Zhe-Wei Jiang, Chi-Yu Lu, Yi-Hsin Ko
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Abstract
The present disclosure describes a method for optimizing metal cuts in standard cells. The method includes placing a standard cell in an layout area and inserting a metal cut along a metal interconnect of the standard cell at a location away from a boundary of the standard cell. The method further includes disconnecting, at the location, a metal portion of the metal interconnect from a remaining portion of the metal interconnect based on the metal cut.
Claims20
A method for optimizing metal cuts in standard cells, the method comprising:
- placing a standard cell in an layout area;
- inserting a metal cut along a metal interconnect of the standard cell at a location away from a boundary of the standard cell;
- and
- disconnecting, at the location, a metal portion of the metal interconnect from a remaining portion of the metal interconnect based on the metal cut, wherein at least one of the placing, inserting, and disconnecting is performed by a processor.
A non-transitory computer-readable medium containing computer-executable program for, when being executed by a processor, implementing a method for optimizing metal cuts in standard cells, comprising:
- placing a standard cell in an layout area;
- inserting a metal cut along a metal interconnect of the standard cell at a location away from a boundary of the standard cell;
- and
- disconnecting, at the location, a metal portion of the metal interconnect from a remaining portion of the metal interconnect based on the metal cut.
A computer system for optimizing metal cuts in standard cells, comprising:
- a memory configured for storing a program and data for optimizing metal cuts;
- a user interface configured for receiving information from a user;
- and
- a processor configured for:
- placing a standard cell in an layout area;
- inserting a metal cut along a metal interconnect of the standard cell at a location away from a boundary of the standard cell;
- and
- disconnecting, at the location, a metal portion of the metal interconnect from a remaining portion of the metal interconnect based on the metal cut.
Dependencies are inferred from the claim text.