Transparent conductive film, touch screen and manufacturing method thereof

A touch screen, comprising:

• a substrate having opposed first and second surfaces, the substrate comprising a touch region in a middle portion thereof and a lead region on a periphery of the touch region;
• a first optical adjustment layer formed on the first surface;
• a first electrode formed on the first optical adjustment layer and within the touch region;
• a first lead formed on the first optical adjustment layer and within the lead region;
• a second optical adjustment layer formed on the second surface;
• a second electrode formed on the second optical adjustment layer and within the touch region;
• and
• a second lead formed on the second optical adjustment layer and within the lead region;
• wherein at least one of the first optical adjustment layer and the second optical adjustment layer comprises a plurality of particles therein, such that a plurality of protrusions corresponding to the plurality of particles are formed on a surface of at least one of the first electrode and the second electrode.

A method of manufacturing a touch screen, comprising:

• providing a transparent conductive film, wherein the transparent conductive film comprises a substrate having opposed first and second surfaces;
• a first optical adjustment layer formed on the first surface;
• a first transparent conductive layer formed on the first optical adjustment layer;
• a first metal layer formed on the first transparent conductive layer;
• a second optical adjustment layer formed on the second surface;
• a second transparent conductive layer formed on the second optical adjustment layer;
• and a second metal layer formed on the second transparent conductive layer;
• wherein at least one of the first optical adjustment layer and the second optical adjustment layer comprises a plurality of particles therein, such that a plurality of protrusions corresponding to the plurality of particles are formed on a surface of at least one of the first metal layer and the second metal layer;
• etching the first metal layer and the second metal layer to expose the first transparent conductive layer and the second transparent conductive layer located in a touch region, and forming a metal lead pattern located in a lead region;
• and
• etching the first transparent conductive layer and the second transparent conductive layer to form a first electrode and a second electrode located in the touch region, and forming a transparent lead pattern located in the lead region;
• wherein the metal lead pattern and the transparent lead pattern cooperatively form an electrode lead.