Exposure apparatus and device manufacturing method
AssigneeNikon Corporation
InventorsHiroaki TAKAIWA, Takashi HORIUCHI
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Abstract
An exposure apparatus includes a projection optical system, a substrate stage which is movable and has a holder to hold a substrate, and a detection apparatus that detects whether liquid is present on a surface of an object, which is disposed lower than a front end of the projection optical system. The surface of the object includes a recessed portion formed on the object. The substrate is exposed by emitting exposure light onto the substrate through the projection optical system and a liquid in a liquid immersion area locally formed on a portion of an upper surface of the substrate.
Claims11
An exposure apparatus comprising:
- a projection optical system;
- a substrate stage which is movable and has a holder to hold a substrate;
- and
- a detection apparatus that detects whether liquid is present on a surface of an object, which is disposed lower than a front end of the projection optical system, wherein
- the surface of the object includes a recessed portion formed on the object, and
- the substrate is exposed by emitting exposure light onto the substrate through the projection optical system and a liquid in a liquid immersion area locally formed on a portion of an upper surface of the substrate.
Dependencies are inferred from the claim text.