Method to Determine a Patterning Process Parameter
AssigneeASML Netherlands B.V.
InventorsMartin Jacobus Johan JAK, Simon Gijsbert Josephus MATHIJSSEN, Kaustuve BHATTACHARYYA, Won-Jae JANG, Jinmoo BYUN
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Abstract
A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.
Claims16
-15. (canceled)
A method to determine a patterning process parameter, the method comprising:
- illuminating a target with radiation comprising a central wavelength and detecting a first result;
- illuminating the target with radiation comprising two different central wavelengths and detecting a second result;
- calculating a first value for an intermediate parameter based on the first result;
- calculating a second value for the intermediate parameter based on the second result;
- and
- calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.
A metrology apparatus to determine a patterning process parameter following performance of a lithographic process, the metrology apparatus being operable to perform the method to determine a patterning process parameter, the method comprising:
- illuminating a target with radiation comprising a central wavelength and detecting a first result;
- illuminating the target with radiation comprising two different central wavelengths and detecting a second result;
- calculating a first value for an intermediate parameter based on the first result;
- calculating a second value for the intermediate parameter based on the second result;
- and
- calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.
A non-transitory computer program product comprising machine-readable instructions for causing a processor to cause performance of the method to determine a patterning process parameter, the method comprising:
- illuminating a target with radiation comprising a central wavelength and detecting a first result;
- illuminating the target with radiation comprising two different central wavelengths and detecting a second result;
- calculating a first value for an intermediate parameter based on the first result;
- calculating a second value for the intermediate parameter based on the second result;
- and
- calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.
Dependencies are inferred from the claim text.