Exposure method and exposure device
AssigneeMitutoyo Corporation
InventorMotonori Ogihara
Life of this patent
Estimating the term…
Abstract
An exposure method for projecting a pattern on an exposure mask onto a work by an exposure control of an exposure light including calculating an exposure position on the work from a relative positional relationship of the exposure mask and the work, setting a range acceptable for projecting the pattern even when the exposure position is off a target exposure position on the work as an exposure position range, and (3) executing an exposure control that irradiates the exposure light to the exposure mask when the exposure position is in the exposure position range, and that stops the exposure light when the exposure position is out of the exposure position range.
Claims15
An exposure method for projecting a pattern of an exposure mask onto a work by an exposure light comprising:
- calculating an exposure position on the work from a relative positional relationship of the exposure mask and the work;
- setting a predetermined range that includes a target exposure position on the work and permits projecting the pattern even when the exposure position is out of the target exposure position as an exposure position range;
- and
- executing an exposure control by an exposure controlling signal that executes irradiation of the exposure light to the exposure mask when the calculated exposure position is in the set exposure position range, and that stops irradiation of the exposure light when the exposure position is out of the exposure position range,
- wherein the exposure light is irradiated for a predetermined exposure time by the exposure control.
An exposure device comprising:
- an exposure light source;
- an exposure mask disposed at a position where an exposure light from the exposure light source is received;
- a projecting lens that projects a pattern of the exposure mask onto a work;
- a detector that detects a relative positional relationship of the exposure mask and the work;
- a moving base that relatively moves the exposure mask and the work to change an exposure position on the work;
- and
- controlling circuitry configured to control at least irradiation/stoppage of the exposure light source,
- wherein the controlling circuitry is further configured to:
- calculate an exposure position on the work from a relative positional relationship of the exposure mask and the work,
- set a predetermined range as an exposure position range that includes a target exposure positon on the work and permits projecting the pattern even when the exposure position is out of the target exposure position, and
- execute an exposure control by an exposure controlling signal that executes irradiation of the exposure light to the exposure mask when the calculated exposure position is in the set exposure position range, and that stops irradiation of the exposure light when the exposure target position is out of the exposure position range, and
- wherein the exposure light is irradiated for a predetermined exposure time by the exposure control.
Dependencies are inferred from the claim text.