Organic thin film structure and method for manufacturing same
AssigneeShenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
InventorWu CAO
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Abstract
The present invention provides an organic thin film structure. The organic thin film is formed on a surface of a glass substrate. At least two color resist blocks are formed by patterning. A recess is formed between the two adjacent color resist blocks. Each of the color resist blocks has a lower color resist layer and an upper color resist layer formed on a surface of the lower color resist layer. A boundary of the upper color resist layer and a boundary the lower color resist layer are connected, and an angle between the boundaries and the surface of the glass substrate ranges from 10° to 60°.
Claims15
An organic thin film structure, comprising an organic thin film layer formed on a surface of a glass substrate;
- wherein at least two color resist blocks are formed by patterning the organic thin film layer;
- and a recess is formed between the two color resist blocks;
- each of the color resist blocks comprising:
- a lower color resist layer formed on the surface of the glass substrate;
- and
- an upper color resist layer formed on a surface of the lower color resist layer, wherein material of the lower color resist layer has a different photosensitivity value from material of the upper color resist layer;
- wherein both a cross-sectional pattern of the lower color resist layer and a cross-sectional pattern of the upper color resist layer are polygonal;
- a total inclination angle of the color resist block defined between a boundary connected between the upper color resist layer and the lower color resist layer and the surface of the glass substrate ranges from 10° to 60°.
An organic thin film structure, comprising an organic thin film layer formed on a surface of a glass substrate;
- wherein at least two color resist blocks are formed by patterning the organic thin film layer;
- and a recess is formed between the two color resist blocks;
- each of the color resist blocks comprising:
- a lower color resist layer formed on the surface of the glass substrate;
- and
- an upper color resist layer formed on a surface of the lower color resist layer;
- wherein both a cross-sectional pattern of the lower color resist layer and a cross-sectional pattern of the upper color resist layer are polygonal;
- a total inclination angle of the color resist block defined between a boundary connected between the upper color resist layer and the lower color resist layer and the surface of the glass substrate ranges from 10° to 60°.
A method for manufacturing an organic thin film, wherein the method comprising:
- a step S510 of providing a glass substrate;
- a step S520 of forming an organic thin film layer on a surface of the glass substrate, and forming at least two color resist blocks by patterning the organic thin film layer;
- a step S520 of comprising:
- a step S5201 of forming a first organic thin film layer on the surface of the glass substrate;
- a step S5202 of forming a second organic thin layer on a surface of the first organic thin film layer;
- and material of the first organic thin film layer having a different photosensitivity value from material of the second organic thin layer;
- and
- a step S5203 of forming a lower color resist layer and an upper color resist layer of the color resist block by a single exposure process in the first organic thin film layer and the second organic thin layer;
- and
- a step S530 of defining a total inclination angle of the color resist block between a boundary connected between the upper color resist layer and the lower color resist layer and the surface of the glass substrate, the total inclination angle of the color resist block ranging from 10° to 60°.
Dependencies are inferred from the claim text.