Method to create a free-standing membrane for biological applications

A method for forming a substrate, comprising:

• providing a substrate having a thin film over a highly etchable layer thereof;
• forming one or more nanopores through the thin film over the highly etchable layer using a pore diameter reduction process;
• and
• selectively removing a portion of the highly etchable layer under the one or more nanopores to form a thin, free-standing membrane.

A substrate, comprising:

• a first silicon layer;
• a dielectric layer disposed over the first silicon layer;
• a second silicon layer disposed over a portion of the dielectric layer;
• a free-standing membrane disposed over the second silicon layer, the free-standing membrane having at least one nanopore and at least one opening formed therethrough;
• a first well disposed below the at least one nanopore;
• and
• a second well disposed above the at least one nanopore.