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US 2019/0085457 A1Published application
Graphene structure forming method and graphene structure forming apparatus
AssigneeTokyo Electron Limited
InventorsRyota IFUKU, Takashi MATSUMOTO
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Abstract
A graphene structure forming method for forming a graphene structure is provided. The method comprises preparing a target substrate, and forming the graphene structure on a surface of the target substrate by remote microwave plasma CVD using a carbon-containing gas as a film-forming raw material gas in a state in which the surface of the target substrate has no catalytic function.
Claims17
A graphene structure forming method for forming a graphene structure, comprising:
- preparing a target substrate;
- and
- forming a graphene structure on a surface of the target substrate by remote microwave plasma CVD using a carbon-containing gas as a film-forming raw material gas in a state in which the surface of the target substrate has no catalytic function.
A graphene structure forming method for forming a graphene structure, comprising:
- preparing a target substrate;
- and
- forming a graphene structure including a carbon nanowall on a surface of the target substrate by remote microwave plasma CVD using a carbon-containing gas as a film-forming raw material gas.
Dependencies are inferred from the claim text.