High pressure and high temperature anneal chamber

A batch processing chamber for annealing substrates under high pressure at high temperature comprising:

• a chamber body enclosing an internal volume, the internal volume configured to accommodate a plurality of substrates disposed therein;
• a gas panel configured to provide a processing fluid into the internal volume;
• a condenser fluidly connected to the internal volume, the condenser configured to condense the processing fluid into liquid phase;
• and
• a temperature-controlled fluid circuit configured to maintain the processing fluid at a temperature above a condensation point of the processing fluid, the temperature-controlled fluid circuit comprising:
• a gas conduit fluidly coupled to a port on the chamber body at a first end, the gas panel at a second end and the condenser at a third end.