Plasma deposition of carbon hardmask

A method of forming a carbon hardmask layer on a substrate, comprising:

• performing a chemical vapor deposition (CVD) process, comprising:
• flowing a hydrocarbon-containing gas and a first inert gas into a processing chamber, wherein the processing chamber includes a substrate positioned over a first electrode and a second electrode positioned above a surface of the substrate, the second electrode having a surface containing a carbon-containing material;
• applying a first RF power to at least the first electrode;
• and
• forming a carbon layer on the surface of the substrate;
• and
• performing a physical vapor deposition (PVD) process, comprising:
• flowing a second inert gas into the processing chamber;
• applying a second RF power to at least the second electrode;
• and
• sputtering carbon from the second electrode onto the carbon layer to form the carbon hardmask layer.