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US 2019/0057543 A1Published application
Method and apparatus for sampling pattern generation for a ray tracing architecture
AssigneeIntel Corporation
InventorDAVID R. BALDWIN
Life of this patent
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Abstract
An apparatus and method for sampling pattern generation in a ray tracing architecture. For example, one embodiment of a graphics processing apparatus comprises: a ray generation circuit to generate a ray stream from one or more image tiles; and a sample pattern generation circuit to generate samples for rays in the ray stream, the samples generated to exhibit at least some randomness across pixels of a given frame but be repeatable across multiple frames.
Claims19
A graphics processing apparatus comprising:
- a ray generation circuit to generate a ray stream from one or more image tiles;
- and
- a sample pattern generation circuit to generate samples for rays in the ray stream, the samples generated to exhibit at least some randomness across pixels of a given frame but be repeatable across multiple frames.
A system comprising:
- a memory to store data and program code;
- a central processing unit (CPU) comprising an instruction cache for caching a portion of the program code and a data cache for caching a portion of the data, the CPU further comprising execution logic to execute at least some of the program code and responsively process at least some of the data, at least a portion of the program code comprising graphics commands;
- a graphics processing subsystem to process the graphics commands and responsively render a plurality of image frames, the graphics processing subsystem comprising:
- a ray generation circuit to generate a ray stream from one or more image tiles;
- and
- a sample pattern generation circuit to generate samples for rays in the ray stream, the samples generated to exhibit at least some randomness across pixels of a given frame but be repeatable across multiple frames.
3 more elements
Dependencies are inferred from the claim text.