Display screen manufacturing method thereof

A method for manufacturing a display screen, comprising:

• providing a TFT (thin film transistor) array substrate;
• forming a first planarization layer on the TFT array substrate;
• forming a combining-structure layer on the first planarization layer, wherein the combining-structure layer comprises a layer of first touch electrodes and a layer of anode electrodes, the layer of first touch electrodes and the layer of anode electrodes are two different layers, and each first touch electrode is arranged between two adjacent anode electrodes, and the steps of forming the combining-structure layer on the first planarization layer comprise:
• depositing the layer of anode electrodes on the first planarization layer, and defining a plurality of first openings in the first planarization layer;
• depositing a second planarization layer on the first planarization layer, and defining a plurality of second openings in the second planarization layer corresponding to the first openings, the anode electrodes are connected to drain electrodes of the TFT array substrate via the first and the second openings respectively;
• and
• forming the layer of first touch electrodes on the second planarization layer;
• forming an organic light emitting layer and a patterned cathode layer successively on the combining-structure layer, wherein the patterned cathode layer comprises a plurality of cathode electrodes as second touch electrodes;
• and
• encapsulating the TFT array substrate and all layers to form the display screen;
• wherein the layer of anode electrodes is made of titanium oxide or silver, and the layer of the first touch electrodes is made of a material selected from a group consisting of silver, titanium, aluminum and molybdenum.