Clean Rooms Having Dilute Hydrogen Peroxide (DHP) Gas and Methods of Use Thereof
AssigneeSynexis LLC
InventorsJames D. LEE, Douglas J. BOSMA
Life of this patent
Estimating the term…
Abstract
Provided are improved clean rooms having dilute hydrogen peroxide (DHP) gas that provides for antiseptic conditions. Also provided are DHP gas containing clean rooms that have reduced levels of volatile organic compounds (VOCs) and methods for preparing clean rooms having DHP gas.
Claims30
A clean room comprising dilute hydrogen peroxide (DHP) gas at a concentration of at least 0.05 parts per million (ppm) up to 10.0 ppm and 0.015 parts per million (ppm) ozone or less.
(canceled)
7-15. (canceled)
17-19. (canceled)
(canceled)
30-38. (canceled)
40-51. (canceled)
A method of providing DHP gas at a concentration of at least 0.05 parts per million (ppm) to said clean room comprising installing a PHPG generating device comprising an air-permeable substrate structure having a catalyst on its surface, a source of light;
- and wherein air flows through said air-permeable substrate structure and the device produces PHPG and directs it away from said air-permeable substrate structure.
54-55. (canceled)
57-61. (canceled)
A method of reducing organic species adsorption-induced contamination during silicon wafer production comprising providing DHP gas at a concentration of at least 0.05 parts per million (ppm) to a silicon wafer production facility clean room.
(canceled)
Dependencies are inferred from the claim text.