Chemical solution feeder, substrate treatment apparatus, method for feeding chemical solution, and method for treating substrate

A method for feeding a chemical solution to a predetermined feed target, the method comprising:

• a first removal step of removing particles in said chemical solution at room temperature injected from a supply source into a feed flow path that is connected at its one end to said supply source for said chemical solution at room temperature, and at its other end to said feed target, and that guides said chemical solution to said feed target from said supply source, the particles being removed with a first filter provided in said feed flow path;
• a heating step of heating said chemical solution in a portion of said feed flow path, closer to said feed target than said first filter, with a heating unit;
• and
• a second removal step of removing particles in said chemical solution at high temperature, heated in said heating step, flowing through said feed flow path toward said feed target, with a second filter provided in a portion of said feed flow path, closer to said feed target than said first filter,
• wherein
• said first filter removes particles by filtering and chemically adsorbing the particles, and
• said second filter removes particles by filtering the particles, said second filter having a particle removing capability with less temperature dependence than the first filter.