Injector of silicon for the semiconductor industry
AssigneeSICO Technology GmbH
InventorsWalter NADRAG, Enrico NADRAG
Life of this patent
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Abstract
An injector (1), which is produced from silicon and allows gas to be introduced into process chambers in processes, in particular processes in semiconductor technology, is proposed. The injector (1) is formed as a tube (2), which if appropriate consists of at least two pieces of tube (10) and in which outlet openings for the gas to be introduced into the process chamber are provided. At least one channel (4) is provided in the tube (2) that serves as an injector (1). The profile of the tube (2) serving as the injector (1) is unround, and therefore deviates from a circular profile, with elongated, triangular or star-shaped forms being possible options.
Claims20
An injector (1) for feeding gas into a process chamber, comprising:
- a tube (2), in which outlet openings for the gas are provided,
- wherein the tube (2) consists of silicon, and
- wherein the tube (2) is made in one part or is put together from at least two one-part pieces of tube (10) in each case to form the tube (2).
Dependencies are inferred from the claim text.