Compositions and methods using same for deposition of silicon-containing film

A method for depositing a silicon-containing film in a flowable chemical vapor deposition process, the method comprising:

• placing a substrate comprising a surface feature into a reactor which is at one or more temperatures ranging from −20° C. to about 400° C.;
• introducing into the reactor a first compound having at least one carbon-carbon double bond or carbon-carbon triple bond wherein the first compound having the formula RnSiR14-n wherein R is selected a linear or branched C2 to C6 alkenyl group, a linear or branched C2 to C6 alkynyl group;
• R1 is selected from hydrogen and a branched C1 to C10 alkyl group;
• and n is a number selected from 0, 1, 2, and 3;
• introducing into the reactor a second compound having at least one Si—H bond wherein the at least one second compound is selected from the group consisting of the following Formula IIA to IIH:
• IIA. a polysilane compound having a formula of SixH2x+2 wherein x is a number from 2 to 6;
• IIB. a compound having the formula R1mSiH4-m wherein R1 is selected from hydrogen and a linear or branched C1 to C10 alkyl group;
• and m is a number selected from 1, 2 and 3;
• IIC. a compound having the formula SiH3—R2—SiH3 wherein R2 is a linear or branched C1 to C6 alkylene group;
• IID. a compound having the formula R3SiH2—R2—SiH2R4 wherein R2 is a linear or branched C1 to C6 alkylene group;
• R3 is selected from hydrogen, a linear or branched C1 to C10 alkyl group, and a C4 to C10 aryl group;
• and R4 is selected from a linear or branched C1 to C10 alkyl group;
• IIE. a compound having the formula (R3R4N)nSiH3-nR1 wherein R1 is selected from hydrogen and a linear or branched C1 to C10 alkyl group;
• R3 is selected from hydrogen, a linear or branched C1 to C10 alkyl group, and a C4 to C10 aryl group;
• and R4 is selected from a linear or branched C1 to C10 alkyl group;
• IIF. a silacycloalkyl compound;
• IIG. a trisilylamine compound or derivatives thereof;
• and
• IIH. a silazane compound having the formula of [(R3R4N)pSiH3-p]2NR1 or [R3pSiH2-pNR1]q wherein R1 is selected from hydrogen and a linear or branched C1 to C10 alkyl group;
• R3 is selected from hydrogen, a linear or branched C1 to C10 alkyl group, and a C4 to C10 aryl group;
• and R4 is selected from a linear or branched C1 to C10 alkyl group;
• p=0, 1, 2;
• q=2 or 3;
• and
• IIIA. An organoaminodisilanes having the formula of (R3R4N)SiH2SiH3 wherein R3 is selected from hydrogen, a branched C1 to C10 alkyl group, and a C4 to C10 aryl group;
• and R4 is selected from a linear or branched C1 to C10 alkyl group.