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US 2019/0055644 A1Published application
Stabilized metal monolayer structure and the manufacturing method thereof
AssigneeIucf-Hyu (Industry-University Cooperation Foundation Hanyang University)
InventorsMyung Mo SUNG, Hong Bum KIM, Jin Won JUNG, Kyu Seok HAN
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Abstract
A stabilized elementary metal structure is disclosed. The stabilized elementary metal structure may include an elementary metal having at least one layer and having a two-dimensional layer structure, and an organic molecular layer provided on at least one of a top surface and a bottom surface of the elementary metal.
Claims16
A stabilized elementary metal structure comprising:
- an elementary metal having at least one layer and having a two-dimensional layer structure;
- and
- an organic molecular layer provided on at least one of a top surface and a bottom surface of the elementary metal.
A stabilized elementary metal structure comprising:
- an elementary metal having at least one layer and having a two-dimensional layer structure,
- wherein the elementary metal provides a band gap.
A method of manufacturing a stabilized elementary metal structure, the method comprising:
- first operation of forming an organic molecular layer on a substrate by a molecular layer deposition (MLD) method;
- second operation of forming an elementary metal having at least one layer on the organic molecular layer by an atomic layer deposition (ALD) method;
- and
- third operation of forming an organic molecular layer on the elementary metal by a molecular layer deposition (MLD) method,
- wherein at least one of the first operation and the third operation is performed.
2 more elements
Dependencies are inferred from the claim text.