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AssigneeHon Hai Precision Industry Co., Ltd.
InventorsSUSUMU SAKIO, KATSUHIKO KISHIMOTO
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A deposition mask capable of performing high-definition patterning while suppressing position gap between a substrate for vapor deposition and an opening arrangement of the deposition mask during vapor deposition and a manufacturing method thereof are provided. A deposition mask (1) includes a resin film (2) having an opening (4) pattern for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition. The deposition mask (1) includes a low-emissivity layer (5) whose emissivity is lower than that of the resin film (2), which is formed at least partly on a surface of the resin film (2) facing a vapor deposition source, thereby suppressing temperature rise of the resin film (2) due to heat radiated from the vapor deposition source.
A deposition mask including a resin film having an opening pattern for film forming a thin layer pattern by vapor deposition on a substrate for vapor deposition, wherein
(canceled)
A method for manufacturing a deposition mask including a resin film having an opening pattern and usable in vapor depositing a vapor deposition material, and having a low-emissivity layer whose emissivity is lower than the emissivity of said resin film on at least a part of a surface of said resin film on a side facing a vapor deposition source, the method comprising;
(canceled)
Dependencies are inferred from the claim text.