Method for Purifying Fluorine Gas
AssigneeCentral Glass Company, Limited
InventorsAkifumi YAO, Kohei OOYA, Yuta TAKEDA, Jun ETO
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AssigneeCentral Glass Company, Limited
InventorsAkifumi YAO, Kohei OOYA, Yuta TAKEDA, Jun ETO
Estimating the term…
Disclosed is a purification method for removing a metal component from a fluorine gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. The content of the hydrogen fluoride in the fluorine gas before the removing step is 50 volume ppm to 1 volume %, relative to the total volume of the fluorine gas, the hydrogen fluoride and the metal component. The metal fluoride is preferably an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.
A method for purifying a fluorine gas by removing a metal component from a fluorine gas that contains hydrogen fluoride and the metal component, the method comprising the step of:
A method for purifying a fluorine gas by removing a metal component from a fluorine gas, wherein the fluorine gas contains hydrogen fluoride and at least one metal component selected from the group consisting of Fe, Cr, Mn, Co, Ti, Mo, Cu and Ni, the method comprising the step of:
A method for manufacturing a purified fluorine gas by removing a metal component contained in a fluorine gas, comprising the step of:
An etching device, comprising:
Dependencies are inferred from the claim text.