Substrate transporting device, substrate treating apparatus, and substrate transporting method

A substrate transporting device, comprising:

• a transport mechanism that is movable in parallel in a given direction and transports a substrate;
• and
• a transport chamber that accommodates the transport mechanism, the transport chamber comprising:
• a first wall disposed on a first side of the given direction of the transport mechanism;
• and
• a plurality of transportation ports each used for moving the substrate between an exterior and an interior of the transport chamber, the substrate transporting device further comprising:
• a first exhaust unit that is disposed closer to the first wall than any of the transportation ports, and exhausts gas in the transport chamber outside the transport chamber, and
• a controller that controls the transport mechanism and the first exhaust unit, wherein
• the controller performs control such that, when the transport mechanism is located in a first proximal area whose distance from the first wall is of a given value or less, and moves toward the first wall, an exhaust amount of the first exhaust unit is larger than that when the transport mechanism is located out of the first proximal area, holds the substrate, and moves toward the first wall.