Patterning material, patterning method, and patterning apparatus
AssigneeNagase Chemtex Corporation
InventorKoji WATANABE
Life of this patent
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Abstract
Provided is a patterning material for three-dimensional stereolithography, with which it is possible to improve the curing speed and suppress a shrinkage of the three-dimensionally shaped article. The patterning material for three-dimensional stereolithography contains a diallyl phthalate prepolymer, a photocurable monomer and a photopolymerization initiator, and is liquid at room temperature. The patterning material is suitable for use in patterning performed by surface exposure. The proportion of the diallyl phthalate prepolymer is, for example, 5 to 40 mass % in the total amount of the diallyl phthalate prepolymer and the photocurable monomer.
Claims12
A patterning material for three-dimensional stereolithography comprising:
- a diallyl phthalate prepolymer;
- a photocurable monomer;
- and
- a photopolymerization initiator,
- wherein the patterning material is liquid at room temperature.
Dependencies are inferred from the claim text.