Deposition on two sides of a web
AssigneeAmprius, Inc.
InventorsRonald J. Mosso, Ghyrn E. Loveness
Life of this patent
Estimating the term…
Abstract
Apparatuses and methods for depositing materials on both sides of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition. Also provided are substrates having materials deposited on both sides that may be fabricated by the methods and apparatuses.
Claims22
-18. (canceled)
A composition comprising:
- a web having a first side and a second side;
- and
- nanowires substrate-rooted to the web substrate surface on both the first side and the second side of the web substrate, wherein the nanowires are silicide nanowires.
A composition comprising:
- a web having a first side and a second side;
- and
- nanowires substrate-rooted to the web substrate surface on both the first side and the second side of the web substrate, wherein the nanowires are crystalline silicon nanowires.
A composition comprising:
- an electrically conductive substrate having a first side and a second side;
- and
- nanowires substrate-rooted to the electrically conductive substrate surface on both the first side and the second side of the electrically conductive substrate, wherein the nanowires are silicide nanowires.
Dependencies are inferred from the claim text.