# US 2018/0324937 A1 · Shock wave nano-technology method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2018/0324937 A1 - Document ID: US20180324937A1 - Status: Published application - Kind: A1 - Application number: 15/731,237 - Filed: 2017-05-08 - Published: 2018-11-08 - Earliest claimed: 2017-05-08 - Inventors: Baruch Boris Gutman - Web page: https://patentgrep.com/patent/US20180324937A1 ## CPC - H05H 1/42: with provisions for introducing materials into the plasma, e.g. powder or liquid {(arc stabilising or constricting arrangements H05H1/3405; coaxial protecting fluids H05H1/341)} - B05B 7/226: {the material being originally a particulate material} - C23C 4/08: containing only metal elements (C23C4/073 takes precedence) - C23C 4/134: Plasma spraying - H05H 1/34: Details, e.g. electrodes, nozzles - B82Y 30/00: Nanotechnology for materials or surface science, e.g. nanocomposites - B82Y 40/00: Manufacture or treatment of nanostructures - H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS - B05B: SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES (spray-mixers with nozzles B01F25/72; processes for applying liquids or other fluent materials to surfaces by spraying B05D) - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ## Abstract The patent described the advantages of detonation plasma spraying, laser pyrolysis technologies, etc., being optimized by pulses with common parameters, like duration, slope for all mentioned above technologies. For example, in some high temperature processes, using pulsed plasma or laser technology, plays vital important role the efficiency of plasma chemical processes. Since the plasma chemical reaction process efficiency is ˜20-30%, its value could be increased up to the thermodynamically feasible level of 60%. The Shock waves created by electrical pulses disintegrates liquid particles up to Nano size fragments, accelerate them and finally formatted a coating with superior characteristics. The influence of the pulses of radiation, detonation, electro impulse plasma can be generated by the same single pulse parameters of duration, slope, etc. ## Claims ### Claim at position 1 I. A method of increasing chemical reaction efficiency from 20-30% up to theoretical feasible 60% comprising the steps of: (a) set up duration of infrared laser radiation of a pulse of around 10−4 s (102 μs) and slop of the pulse 106-109 A/s; (b) set up a resin in a hermetical chamber with transparent wall which located along his pulse's shot; (c) is being measuring gas products because of interaction of a resin with the pulse to calculate Chemical reaction efficiency. ### Claim at position 2 II. A method of increasing a bond strength of coatings with substrate in 4-5-fold comprising the steps of: (a) into a Plasma torch which is operated by Air is being inserting Hydrocarbons to create the detonation process; (b) set up the duration of detonation pulse is being around 10−4 s (102 μs) at the slop of a pulse's front is 106-109 A/s. ### Claim at position 3 III. A method of producing a Nano-particles which is in turn formatting Nano coatings comprising the steps of; (a) igniting DC/AC plasma arc in plasma forming gas; (b) imposing on the plasma arc the pulses ΔI in direct/reverse or both polarity plasma current I; (c) set up the slope of the front of pulses 106-109 A/s at amplitude ΔI/Iplasma current≥4-5, duration of them for subtraction range is 102 μs≥τ25 μs, frequency range Fmodulation≥20 kHz which is necessary to control length Larc and accordingly V-I characteristics of DC/AC arc of plasma torch, generating a shock waves disintegration some liquid particles up to Nano size fragments and accelerating them. ### Claim at position 4 IV. The method as define in claim I, II, III, the common “time duration of pulse of a different nature: laser initiated chemical reaction, detonation spraying process, pulses of current for spraying (claims #I, II, III) must be set up the same duration around 102 μs under slope of the pulses 106-106 A/s. ### Claim at position 5 V. To exclude of oxygen from Air plasma and increase an enthalpy of plasma—should be inserting in the plasma a hydrocarbon which increase a coefficient of spraying efficiency and, in turn, convert the torch with a vorticial stabilization of an arc into high effective pseudo-laminar plasma. ### Claim at position 6 VI. The point of material feeding in the torch must be in an area where a plasma arc is attached to the anode. ### Claim at position 7 VII. The method as define in claim III to decrease nonmetallic contaminations (Me-metal, MeO, MeN, MeC) contents in 3-4-fold in spraying product. ### Claim at position 8 VI. The method as define in claim III wherein to control a porosity of coatings in the range 0-40% should be variating the frequency of pulse modulation and an anode length within 60%. ### Claim at position 9 VII. The method as define in claim III wherein to convert plasma spraying torch operation to the regime of Nano particles generation up to size 0.1-5 nm—should increase the enthalpy of plasma jet to disintegrate and accelerate them by shock waves created by pulse modulation. ### Claim at position 10 VIII. The method as define in claim III wherein to change the Larc relatively to the point of powder feeding for spraying which occur impact on parameters of spraying, torch characteristics, etc., should be set up a velocity arc's electrons close to the phase velocity of wave which is creating by pulse modulator: these resonant electrons gain energy from the wave that led to control the Larc and moreover is raising heat efficiency of the torch up to 30%. ### Claim at position 11 IX. The method as define in claim III wherein by changing the frequency modulation can be find the value corresponding to a minimal average current I vs. maximal voltage V and Larc. ### Claim at position 12 X. The method as define in claim III wherein suitable time const of a type of plasma forming gas should be lower than 30 μs to create a high effective shock wave. ### Claim at position 13 XI. The method as define in claim III wherein when the pulses are applied to an arc in the reverse polarity, the integral characteristic of disintegrating of the particles reaches 100% at frequency corresponding to the growth of large-scale shunting of the arc at the spraying wire-anode. ### Claim at position 14 XII. The method as define in claim III wherein the minimum size of the sprayed particles is determined by a number of shock waves interacting with the particle during its flight. ### Claim at position 15 XIII. The method as define in claim III; the use of current modulation makes the process of spraying less sensitive to the initial dimensions of a spraying particles than in traditional technology. ### Claim at position 16 XIV. The method as define in claim III wherein a plasma deposition of coatings in a regime of superimposing current pulses in a reverse polarity to the arc leads to an increase in an adhesion of the coatings to the substrate up to the detonation level and reduces the gas permeability of the coatings by an order of magnitude. ### Claim at position 17 XV. Plasma cutting speed can be increased by30% with rise of pulse amplitude in the direct polarity to the arc and upper limit of cutting speed is restricted by a cathode failure.