# US 2018/0323401 A1 · Laminate and method of producing the same, gas barrier film and method of producing the same, and organic light-emitting element

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- Number: US 2018/0323401 A1
- Document ID: US20180323401A1
- Status: Published application
- Kind: A1
- Application number: 16/019,903
- Filed: 2018-06-27
- Published: 2018-11-08
- Earliest claimed: 2015-12-28
- Assignees: Toppan Printing Co., Ltd.
- Applicants: Toppan Printing Co., Ltd.
- Inventors: Jin SATO; Mitsuru KANO; Hiroshi KOYAMA; Kyoko KUROKI
- Web page: https://patentgrep.com/patent/US20180323401A1

## CPC

- C23C 16/0272: {Deposition of sub-layers, e.g. to promote the adhesion of the main coating}
- B32B 9/00: Layered products comprising a {layer of a} particular substance not covered by groups B32B11/00 - B32B29/00
- C23C 16/30: Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C 16/403: {of aluminium, magnesium or beryllium}
- C23C 16/45525: {Atomic layer deposition [ALD]}
- C23C 16/45555: {applied in non-semiconductor technology}
- C23C 16/56: After-treatment
- H05B 33/02: Details
- H05B 33/04: Sealing arrangements {, e.g. against humidity}
- H10K 50/844: Encapsulations
- H10K 2102/00: Constructional details relating to the organic devices covered by this subclass
- H10K 2102/351: {Thickness}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- H05B: ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A laminate includes: a substrate having a first surface and made of a high-molecular-weight material; an undercoat layer located on at least part of the first surface of the substrate and containing a first inorganic substance that has adsorption sites to be coupled to precursors serving as film-forming materials of an atomic layer deposition film; a functional layer located covering an outer surface of the undercoat layer and containing a second inorganic substance to be coupled to the adsorption sites of the undercoat layer, the functional layer being the atomic layer deposition film formed of the precursors; and an overcoat layer located covering an outer surface of the functional layer and containing a third inorganic substance.

## Claims

### Claim 1

A laminate comprising:
a substrate having a first surface and made of a high-molecular-weight material;
an undercoat layer located on at least part of the first surface of the substrate and containing a first inorganic substance that has adsorption sites to be coupled to precursors serving as film-forming materials of an atomic layer deposition film;
a functional layer located covering an outer surface of the undercoat layer and containing a second inorganic substance to be coupled to the adsorption sites of the undercoat layer, the functional layer being the atomic layer deposition film formed of the precursors; and
an overcoat layer located covering an outer surface of the functional layer and containing a third inorganic substance.

### Claim 2 (depends on 1)

The laminate of claim 1, wherein the undercoat layer and the overcoat layer are inorganic layers containing at least one element from among group III elements, group IV elements, group V elements, and lanthanoid elements.

### Claim 3 (depends on 1)

The laminate of claim 1, wherein the undercoat layer and the overcoat layer contain at least one of an oxide, a nitride, and an oxynitride.

### Claim 4 (depends on 1)

The laminate of claim 1, wherein the undercoat layer and the overcoat layer contain tantalum (Ta).

### Claim 5 (depends on 1)

The laminate of claim 1, wherein the undercoat layer has a thickness in a range of 1 nm or more to 200 nm or less.

### Claim 6 (depends on 1)

The laminate of claim 1, wherein the functional layer has a thickness in a range of 0.5 nm or more to 200 nm or less.

### Claim 7 (depends on 1)

The laminate of claim 1, wherein the overcoat layer has a thickness in a range of 5 nm or more to 200 nm or less.

### Claim 8 (depends on 1)

The laminate of claim 1, wherein the adsorption sites located on the outer surface of the undercoat layer have oxygen (O) atoms or nitrogen (N) atoms.

### Claim 9 (depends on 1)

A gas barrier film comprising the laminate of claim 1, wherein the laminate has a water vapor transmission rate of 0.5 g/(m2 day) or less.

### Claim 10 (depends on 1)

An organic light-emitting element comprising the laminate of claim 1, a first electrode layer, a light-emitting layer, and a second electrode layer.

### Claim 11 (depends on 10)

The organic light-emitting element of claim 10, characterized in that the laminate has a water vapor transmission rate of 0.01 g/(m2 day) or less.

### Claim 12

A method of producing a laminate, comprising:
placing a substrate made of a high-molecular-weight material in a vacuum chamber;
forming an undercoat layer containing a first inorganic substance that has adsorption sites to be coupled to precursors serving as materials for forming an atomic layer deposition film, on at least part of an outer surface of the substrate;
forming a functional layer from the precursors by atomic layer deposition to cover an outer surface of the undercoat layer, the functional layer containing a second inorganic substance coupled to the adsorption sites; and
forming an overcoat layer containing a third inorganic substance to cover an outer surface of the functional layer.

### Claim 13 (depends on 12)

The method of producing a laminate of claim 12, comprising:
a first step of supplying the precursors so as to be coupled to the adsorption sites on the outer surface of the undercoat layer, when forming the functional layer;
a second step, following the first step, of discharging the precursors not coupled to the adsorption sites, from the vacuum chamber;
a third step of repeating the first step and the second step a predetermined number of times;
a fourth step, following the third step, of supplying a reaction gas into the vacuum chamber and applying a voltage to the reaction gas to generate plasma for reaction of the plasma with the precursor so that an atomic layer deposition film with a thickness of one atomic layer is formed; and
performing, following the fourth step, a cycle of the first to fourth steps 15 times or more so that the laminated atomic layer deposition film has a total thickness corresponding to a thickness predetermined for the functional layer.

### Claim 14 (depends on 12)

The method of producing a laminate of claim 12, wherein the undercoat layer and the overcoat layer are formed by chemical vapor deposition or physical vapor deposition.

### Claim 15 (depends on 12)

The method of producing a laminate of claim 12, wherein the undercoat layer and the overcoat layer are inorganic layers containing at least one element from among group III elements, group IV elements, group V elements, and lanthanoid elements.

### Claim 16 (depends on 12)

The method of producing a laminate of claim 12, wherein the undercoat layer is so formed as to have a thickness in a range of 1 nm or more to 20 nm or less.

### Claim 17 (depends on 12)

The method of producing a laminate of claim 12, wherein the functional layer is so formed as to have a thickness in a range of 1 nm or more to 200 nm or less.

### Claim 18 (depends on 12)

The method of producing a laminate of claim 12, wherein the overcoat layer is so formed as to have a thickness in a range of 5 nm or more to 200 nm or less.

### Claim 19 (depends on 12)

A method of producing a gas barrier film, comprising forming the laminate through the method of producing a laminate of claim 12 so as to have a water vapor transmission rate of 0.5 g/(m2 day) or less.

### Claim 20

A method of producing a laminate, comprising:
forming a primer layer including pores with a maximum diameter of 1.0 nm or less using an inorganic material, on at least part of an outer surface of a substrate made of an organic polymer and placed in a vacuum chamber; and
forming an atomic layer deposition film by supplying precursors serving as film-forming materials to an outer surface of the primer layer to allow the precursors to react with a reaction gas on at least part of the outer surface of the primer layer.