Production apparatus and production method for fine particles
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsMASAAKI TANABE, HISAO NAGAI, TAKESHI KOIWASAKI, TAKAFUMI OKUMA
Life of this patent
Estimating the term…
Loading patent…
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsMASAAKI TANABE, HISAO NAGAI, TAKESHI KOIWASAKI, TAKAFUMI OKUMA
Estimating the term…
A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a plurality of electrodes in a vertical direction inside a vacuum chamber. The material supply device further includes a first gas supply port that supplies a first shield gas arranged in an inner periphery of the plural material supply ports and plural second gas supply ports that supply a second shield gas arranged in an outer periphery of the plural material supply ports.
A production apparatus for fine particles comprising:
Dependencies are inferred from the claim text.