Method for protecting a mems unit against infrared investigations and mems unit
AssigneeRobert Bosch GmbH
InventorsMichael Curcic, Oliver Willers, Sven Zinober, Ulrich Kunz
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Abstract
A method is provided for protecting a MEMS unit, in particular a MEMS sensor, against infrared investigations, a surface patterning being performed for at least one first area of a surface of the MEMS unit, the first area absorbing, reflecting or diffusely scattering more than 50%, in particular more than 90% of an infrared light incident upon it.
Claims14
A method for protecting a MEMS unit against infrared investigations, the method comprising:
- performing a surface patterning being for at least one first area of a surface of the MEMS unit, the first area one of absorbing, reflecting or diffusely scattering more than 50% of an infrared light incident upon it.
A MEMS unit having at least one first area of a surface having a surface patterning, the first area absorbing, reflecting or diffusely scattering more than of an irradiated infrared light.
Dependencies are inferred from the claim text.