Method and system for mom capacitance value control
AssigneeShanghai Huali Microelectronics Corporation
InventorsYeqing Cui, Ran Huang, Jianning Deng
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AssigneeShanghai Huali Microelectronics Corporation
InventorsYeqing Cui, Ran Huang, Jianning Deng
Estimating the term…
A method for MOM capacitance value control is disclosed. The method comprises: S01: setting a target thicknesses for each metal layers; S02: after forming a current metal layer, measuring a thickness of the current metal layer; when the thickness of the current metal layer is equal to or less than a threshold value, then turning to step S03; S03: calculating multiple capacitance variations related to the current metal layer according to the thickness of the current metal layer; wherein each of the capacitance variation related to the current metal layer is between an actual capacitance value of a MOM capacitor combination associated with the current metal layer and a target capacitance value of the same MOM capacitor combination; S04: calculating updated target thicknesses for all subsequent metal layers according to the capacitance variations related to the current metal layer.
A method for MOM capacitance value control, which comprises the following steps:
A system for MOM capacitance value control. The system comprises:
Dependencies are inferred from the claim text.