System design for in-line particle and contamination metrology for showerhead and electrode parts

A system for testing cleanliness of a component of a substrate processing chamber, the system comprising:

• a vacuum chamber, wherein the vacuum chamber includes
• an inlet provided in an upper surface of the vacuum chamber, wherein the inlet is arranged to be in fluid communication with an interior of the component, and
• a pedestal arranged below the inlet;
• a purge gas source, wherein the inlet is in fluid communication with the purge gas source via a manifold, and wherein the purge gas source is configured to provide a purge gas to the vacuum chamber with a test substrate arranged on the pedestal;
• and
• a pump configured to (i) pump down the vacuum chamber to a first pressure prior to the purge gas source providing the purge gas to the vacuum chamber and (ii) vent the vacuum chamber subsequent to the purge gas being provided to the vacuum chamber.