Semiconductor processing device equipped with process chamber
AssigneesAllied Techfinders Co., Ltd., Kee Won SUH
InventorKee Won SUH
Life of this patent
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Abstract
A semiconductor processing device according to the present invention includes a process chamber having an inner space in which plasma is generated and a chuck unit disposed in the inner space and supporting a substrate processed by the plasma. The process chamber includes a first chamber portion and a second chamber portion that are opened from each other, and when the first chamber portion and the second chamber portion are closed together, the process chamber is provided with the inner space in which the plasma is generated. When the first chamber portion and the second chamber portion are opened from each other, the chuck unit is exposed to outside.
Claims13
A semiconductor processing device equipped with a process chamber, the device comprising:
- a chuck unit supporting a substrate;
- and
- a process chamber in which the chuck unit is disposed, the process chamber having an inner space in which the substrate is processed,
- wherein the process chamber is divided into a first chamber portion and a second chamber portion on the basis of a division surface,
- when the first chamber portion and the second chamber portion are closed together at the division surface, the inner space of the process chamber is closed, and
- when the first chamber portion and the second chamber portion are opened from each other, the inner space of the process chamber and the chuck unit are exposed to outside.
Dependencies are inferred from the claim text.