Semiconductor processing device

A semiconductor processing device comprising:

• a reaction chamber, a first gas inlet mechanism, and a second gas inlet mechanism that includes a gas inlet, a uniform-flow chamber, and a switch element, wherein:
• the first gas inlet mechanism is arranged to deliver a first process gas into the reaction chamber, and the second gas inlet mechanism is arranged to deliver a second process gas from the gas inlet into the reaction chamber through the uniform-flow chamber;
• the switch element that is disposed between the uniform-flow chamber and the reaction chamber includes a movable member, wherein:
• when the second process gas is being delivered into the uniform-flow chamber from the gas inlet, a gas pressure applied by the second process gas causes the movable member to move and turn the switch element on to communication the uniform-flow chamber with the reaction chamber so as to bring the second process gas into the reaction chamber, and
• when no second process gas is being delivered into the uniform-flow chamber, the movable member of the switch element remains at an original position to isolate the uniform-flow chamber from the reaction chamber.