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US 2018/0294153 A1Published application
Apparatus And Methods For Backside Passivation
AssigneeApplied Materials, Inc.
InventorsLara Hawrylchak, Jeff Tobin
Life of this patent
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Abstract
Provided apparatus and methods for back side passivation of a substrate. The systems comprise an elongate support with an open top surface forming a support ring so that when a substrate is on the support ring, a cavity is formed within the elongate support. A plasma generator is coupled to the cavity to generate a plasma within the cavity to deposit a passivation film on the back side of the substrate.
Claims20
A processing method comprising:
- placing a substrate in a chamber on an elongate substrate support, the substrate having a front side to be processed and a back side, the elongate substrate support having a cylindrical body with an open tope surface with a support ring to hold the substrate by an edge region, the cylindrical body defining a cavity within the elongate substrate support;
- passivating the back side of the substrate in the chamber;
- and
- processing the front side of the substrate, wherein processing comprises heating the substrate.
1 more element
A processing method comprising:
- placing a substrate in a chamber on an elongate substrate support, the substrate having a front side to be processed and a back side, the elongate substrate support having a cylindrical body with an open tope surface with a support ring to hold the substrate by an edge region, the cylindrical body defining a cavity within the elongate substrate support, the substrate moved closer to the substrate support using a plurality of lift pins, the lift pins passing downward through openings in the top surface of the substrate support and curving in toward a center of the cavity to form support ends inside the cavity below the top surface of the substrate support;
- passivating the back side of the substrate in the chamber by exposing the back side of the substrate to plasma to form a film comprising one or more of a nitride or an oxide layer;
- and
- processing the front side of the substrate, wherein processing comprises heating the substrate.
1 more element
Dependencies are inferred from the claim text.