System and method for use in electron microscopy
AssigneeTechnion Research & Development Foundation Limited
InventorsIdo KAMINER, Maor MUTZAFI, Gal HARARI, Mordechay SEGEV
Life of this patent
Estimating the term…
Abstract
An electron beam shaping unit for use in electron beam column and a method for designing thereof is presented. The electron beam shaping unit is configured for affecting electron beams of high density or strong electron-electron repulsion. These 5 beams can always be modeled with multi electron wave function. The electron beam shaping unit comprises a mask unit configured for affecting propagation of electrons therethrough to thereby form a propagating electron beam having, at far field, radial shape as determined by multi-electron non-linear function being an eigen function determined by a multi-electron Hartree-Fock Hamiltonian.
Claims21
An electron beam shaping unit for use in electron beam column, the electron beam shaping unit is configured for affecting multi electron wave function and comprising a mask unit configured for affecting propagation of electrons therethrough to thereby form at far field thereof a propagating electron beam having radial shape as determined by MENL function being an eigen function determined by a multi-electron Hartree-Fock Hamiltonian.
A method for use in design of an electron beam column, the method comprising:
- providing data about desired electron beam parameters;
- determining corresponding parameters for a multi-electron Hamiltonian;
- determining an eigen function of said multi-electron Hamiltonian corresponding to the desired electron beam parameters;
- determining a transmission function providing said eigen function and determining structure of a mask having said transmission function when transmitting plane wave electron beam therethrough.
An electron beam shaping unit for use in electron beam column, the beam shaping unit being characterized in the following:
- (a) said electron beam shaping unit being configured for affecting electron wave function passing;
- and
- (b) said electron beam shaping unit being configured to affect said electron wave function passing therethrough to form a substantially not diverging multi-electron wave function.
Dependencies are inferred from the claim text.